Filter by

  • Publication Year
  • Availability
  • Attachment
  • Collection Type
  • General Material Designation
    See More
  • Location
  • Language
Found 1 from your keywords: subject="Extreme ultraviolet l...
cover
Efficient extreme ultraviolet mirror design :an FDTD approach /
Comment Share
Institute of Physics (Great Britain),Lee, Yen-Min,

"Version: 202109"--Title page verso.Includes bibliographical references.1. Introduction to optical lithography -- 1.1. Principle of optical lithography -- 1.2. Evolution and history -- 1.3. Interrelation with IC manufacturing -- 1.4. The next-generation optical lithography : extreme ultraviolet (EUV) lithography2. Multilayer mirrors in extreme ultraviolet lithography -- 2.1. Composition and fab…

Edition
-
ISBN/ISSN
9780750326520
Collation
1 online resource (various pagings) :illustrations (some color).
Series Title
-
Call Number
-